| AVS 54th International Symposium | |
| Advanced Surface Engineering | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | SE+PS-MoA1 Modulated Pulse Power Deposition of Nanometer-Scale Multilayered Coatings R. Chistyakov, B. Abraham, Zond, Inc./Zpulser, LLC, W.D. Sproul, Reactive Sputtering, Inc., J.J. Moore, J. Lin, Colorado School of Mines |
| 2:20pm | SE+PS-MoA2 Reactive High Power Impulse Magnetron Sputter Deposition of Alumina E. Wallin, S. Swedin, M. Lattemann, U. Helmersson, Linköping University, Sweden |
| 2:40pm | SE+PS-MoA3 Invited Paper Effect of Sub-Surface Reactions on the Growth of Nano-Structured Functional Thin Films Deposited under Energetic Ion Bombardment A. Amassian, M. Dudek, P. Jedrzejowski, R. Vernhes, O. Zabeida, P. Desjardins, J.E. Klemberg-Sapieha, L. Martinu, Ecole Polytechnique, Canada |
| 3:40pm | SE+PS-MoA6 Microstructure Evolution in High Power Magnetron Sputter Deposited Titanium Nitride M. Lattemann, D. Jädernäs, U. Helmersson, Linköping University, Sweden |
| 4:00pm | SE+PS-MoA7 High Power Impulse Magnetron Sputtering (HIPIMS): Scaling Up to the Industrial Level G. Greczynski, J. Bohlmark, Chemfilt Ionsputtering AB, Sweden |
| 4:20pm | SE+PS-MoA8 Invited Paper Mechanisms of Adhesion Enhancement by High Power Impulse Magnetron Sputtering A.P. Ehiasarian, Sheffield Hallam University, UK |
| 5:00pm | SE+PS-MoA10 Deposition Rate of High Power Pulsed Magnetron Sputtered Cu J. Emmerlich, S. Mráz, R. Snyders, K. Jiang, J.M. Schneider, RWTH Aachen University, Germany |