| AVS 54th International Symposium | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:40pm | PS2-WeA1 Activation of Polymer Surfaces by Electron Beam Generated Plasmas E.H. Lock, S.G. Walton, R.F. Fernsler, Naval Research Laboratory |
| 2:00pm | PS2-WeA2 Invited Paper Impact of Plasma Etching Processes on 193 nm Photoresists: Etch Resistance and Line Width Roughness E. Pargon, J. Thiault, M. Martin, CNRS, France, J. Foucher, CEA-LETI, France, G. Cunge, O. Joubert, CNRS, France, Th. Lill, Applied Materials Inc. |
| 2:40pm | PS2-WeA4 Plasma Etching Performance of Thin Polymeric and Photoresist Films N. Vourdas, G. Kokkoris, E. Gogolides, Institute of Microelectronics, NCSR "Demokritos", Greece |
| 3:00pm | PS2-WeA5 Fabrication of Organic Polymers with Tuned Properties and Their Correlation to Plasma-diagnostic Parameters G. Franz, University of Applied Sciences, Germany, D. Voss, Plasma-Parylene Coating Services |
| 4:00pm | PS2-WeA8 Study of Plasma-Surface Interactions of Styrene and Vinylpyridine Polymers in Ar/C4F8/N2 Discharges R.L. Bruce, T. Kwon, S. Engelmann, F. Weilnboeck, M. Sumiya, R. Phaneuf, G.S. Oehrlein, University of Maryland, College Park, B. Long, G. Willson, University of Texas, Austin, D.G. Nest, J.J. Vegh, D.B. Graves, University of California, Berkeley, A. Alizadeh, GE Electrics Global Research Center |
| 4:20pm | PS2-WeA9 Advanced Plasma Treatments for Cleaning and Protection of Metal Artefacts A. Milella, University of Bari, Italy, F. Palumbo, CNR-IMIP, Bari, Italy, S. Grassini, E. Angelini, Polytechnic of Turin, Italy, R. d'Agostino, F. Fracassi, University of Bari, Italy |
| 4:40pm | PS2-WeA10 Cell Growth on Plasma Deposited Micro- and Nano Patterned Teflon-Like Coatings P. Favia, E. Sardella, F. Intranuovo, University of Bari, Italy, P. Rossini, Plasma Solution Srl, Spin off of the University of Bari, Italy, R. Gristina, Institute of Inorganic Methodologies and Plasma (IMIP) CNR, Italy, M. Nardulli, University of Bari, Italy |
| 5:00pm | PS2-WeA11 Studies of Plasma Surface Activation for Adhesion Enhancement of Polymer Materials in Nanotransfer Printing D.Y. Lee, G.S. Oehrlein, D.R. Hines, University of Maryland College Park, C.M. Stafford, C.L. Soles, D.M. DeLongchamp, E.K. Lin, National Institute of Standards and Technology |