| AVS 54th International Symposium | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:40pm | PS1-TuA1 Process Performance of CO2 In Situ Photoresist Ashing Processes and Their Influence on ULK Materials Modifications M.S. Kuo, G.S. Oehrlein, University of Maryland at College Park, S. Sirard, E.A. Hudson, Lam Research Corp. |
| 2:00pm | PS1-TuA2 SiOCH Damage in N2/H2 Plasma M. Fukasawa, T. Tatsumi, K. Nagahata, Sony Corporation, Japan, S. Uchida, S. Takashima, M. Hori, Nagoya University, Japan, Y. Kamide, Sony Corporation, Japan |
| 2:20pm | PS1-TuA3 Study of Downstream O2 Plasma Damage to Blanket and Patterned CDO Low k Films J. Bao, H. Shi, H. Huang, J. Liu, P.S. Ho, E. Paek, G.S. Hwang, The University of Texas at Austin |
| 2:40pm | PS1-TuA4 Ion- and Radical-Induced Ultra Low-k Damage Mechanisms M.A. Goldman, S.H. Kim, D.B. Graves, University of California, Berkeley |
| 3:00pm | PS1-TuA5 Evaluation of Plasma Damages due to VUV Light, UV Light, Radicals, Ions and Interaction of Light and Radicals on Low-k Films S. Uchida, S. Takashima, M. Hori, Nagoya University, Japan, M. Fukasawa, K. Oshima, K. Nagahata, T. Tatsumi, Sony Corporation, Japan |
| 4:00pm | PS1-TuA8 Low-Damage Low-k Etching by CF3I Plasma with Low Global Warming Potential E. Soda, S. Kondo, Selete, Japan, Y. Ichihashi, A. Sato, H. Ohtake, S. Samukawa, Tohoku University, Japan, S. Saito, Selete, Japan |
| 4:20pm | PS1-TuA9 Ash Plasma Exposure of Hybrid Material (SiOCH and Porogen): Comparison with Porous SiOCH M. Darnon, CNRS, France, T. Chevolleau, LTM-CNRS, France, T. David, CEA-LETI-MINATEC, France, L. Vallier, LTM-CNRS, France, J. Torres, STM, France, O. Joubert, LTM-CNRS, France |
| 4:40pm | PS1-TuA10 Effects of Combining H Radical Treatment and Low-k Restoration for Extreme Ultra Low-k L.H. Chen, S. Tahara, Tokyo Electron AT LTD, Japan, R. Asako, Tokyo Electron LTD, Japan, K. Yamazaki, Tokyo Electron AT LTD, Japan, Y. Ohsawa, Tokyo Electron LTD, Japan, Y. Chiba, Tokyo Electron AT LTD, Japan, H. Nagai, Tokyo Electron LTD, Japan, K. Kubota, Tokyo Electron AT LTD, Japan, K. Maekawa, Tokyo Electron LTD, Japan |
| 5:00pm | PS1-TuA11 Process Induced Damages and Their Recovery for Highly-Porous Self-Assembled Porous Silica Low-k Film K. Kinoshita, S. Chikaki, M. Nihei, Selete Inc., Japan, H. Tanaka, K. Kohmura, Mitsui Chemicals, Inc., Japan, T. Nakayama, ULVAC, Inc., Japan, T. Kikkawa, ASRC, AIST, Japan |