| AVS 54th International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS1-ThA1 Development of Atomic Radical Monitoring Probe for Spatial Distribution Measurements and its Application to Reactive Plasma Processes S. Takashima, Nagoya University, Japan, S. Takahashi, K. Yamakawa, S. Den, Katagiri Engineering Co., Ltd., Japan, H. Kano, NU-EcoEngineering Co., Ltd., Japan, M. Hori, Nagoya University, Japan |
| 2:20pm | PS1-ThA2 Measurement of Absolute Density of Argon Metastables by using Laser Adsorption Spectroscopy T. Ohba, T. Makabe, KEIO University, Japan |
| 2:40pm | PS1-ThA3 Gas Phase Studies of CH3OH Plasmas Using Optical Emission Spectroscopy K.J. Trevino, E.R. Fisher, Colorado State University |
| 3:00pm | PS1-ThA4 Measurement of the Gas Temperature Distribution in UHF-ECR Dielectric Etching System H. Kobayashi, K. Yokogawa, K. Maeda, M. Izawa, Hitachi, Ltd., Japan |
| 3:40pm | PS1-ThA6 Research at CPMI Towards Making EUVL a Success D.N. Ruzic, S.N. Srivastava, K.C. Thompson, H. Shin, J.R. Sporre, E.R. Ritz, University of Illinois at Urbana-Champaign |
| 4:00pm | PS1-ThA7 Inductively Coupled Plasma Radio Frequency Electrical Characteristic Measurement for Deposition of CNTs. W.-C. Chen, Academia Sinica, Taiwan, C. Mahony, University of Ulster, UK, K.-H. Chen, Academia Sinica, Taiwan, L.-C. Chen, National Taiwan University |
| 4:20pm | PS1-ThA8 Invited Paper Process Control through Diagnostics and Understanding: Multi-frequency Discharges and Atmospheric Pressure Plasmas T. Gans, Queen's University Belfast, UK |