AVS 54th International Symposium
    Electronic Materials and Processing Wednesday Sessions

Session EM-WeM
Contacts, Interfaces and Defects in Semiconductors

Wednesday, October 17, 2007, 8:00 am, Room 612
Moderator: L.M. Porter, Carnegie Mellon University


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am EM-WeM1
Role of Hydrogen Bonding Environment in Amorphous Silicon Films for Passivation of Crystalline Silicon Based Photovoltaic Devices
M.Z. Burrows, U.K. Das, R.L. Opila, R.W. Birkmire, University of Delaware
8:20am EM-WeM2
Impact of Intrinsic Vacancies on Phase Change and Epitaxial Growth of In2Se3 on Si(111)
C.Y. Lu, E.N. Yitamben, T.C. Lovejoy, University of Washington, K.M. Beck, A.G. Joly, Pacific Northwest National Laboratory, M.A. Olmstead, F.S. Ohuchi, University of Washington
8:40am EM-WeM3 Invited Paper
Reliability of Electrical Contacts to Single Crystal SiC
R.S. Okojie, NASA Glenn Research Center
9:20am EM-WeM5
Epitaxial CVD of Metallic HfB2 on SiC Substrates
Y. Yang, University of Illinois at Urbana-Champaign, V.M. Torres, Dow Corning Compound Semiconductor, J.R. Abelson, University of Illinois at Urbana-Champaign
9:40am EM-WeM6
Surface and Grain Boundary Electron Scattering in Encapsulated Cu Thin Films
T. Sun, B. Yao, University of Central Florida, V. Kumar, Carnegie Mellon University, A.P. Warren, K.R. Coffey, University of Central Florida, K. Barmak, Carnegie Mellon University
10:40am EM-WeM9
Microstructural Evolution of Nickel Germanides in the Ni1-xTax/Ge Systems during In-situ Annealing
J.W. Lee, J.H. Bae, M.H. Park, H.B. Kang, H. Kim, C.W. Yang, Sungkyunkwan University, Korea
11:00am EM-WeM10
Probing the Effect of Interaction and Thermal Expansion Mismatch between Ge and Templated Mask on Defects during Selective Molecular Beam Epitaxy of Ge on Si
D. Leonhardt, Q. Li, S.M. Han, University of New Mexico
11:20am EM-WeM11
Silver-Bearing Ohmic Contacts for AlGaN/GaN Heterostructures
M.A. Miller, S.E. Mohney, The Pennsylvania State University
11:40am EM-WeM12
Schottky Barrier Characteristics and Interfacial Reactions of Ir and Ti Gate Metallizations on In0.52Al0.48As/In0.53Ga0.47As High Electron Mobility Transistors
L. Wang, I. Adesida, University of Illinois at Urbana-Champaign
12:00pm EM-WeM13
Improvement of AlGaN/GaN HEMT and GaN Schottky Contact Device Performance by Reduction of Epitaxial Film Dislocation Density
D.J. Ewing, M.A. Derenge, P.B. Shah, U. Lee, T.S. Zheleva, K.A. Jones, Army Research Lab