| AVS 54th International Symposium | |
| Thin Film | Thursday Sessions |
| Session TF2-ThA |
| Session: | Computational Aspects of Thin Films |
| Presenter: | R.B. van Dover, Cornell University |
| Authors: | J.M. Gregoire, Cornell University M.B. Lobovsky, Cornell University M.F. Heinz, Cornell University F.J. DiSalvo, Cornell University R.B. van Dover, Cornell University |
| Correspondent: | Click to Email |
The use of traditional characterization techniques to determine elemental compositions in composition spread thin films is time-intensive. Combinatorial, high-throughput studies of thin film materials demand high-throughput determination film composition. We discuss the possibility of calculating codeposited film compositions from deposition profiles obtained during single-source sputtering. In the context of DC magnetron sputtering, we find that while this technique is appropriate for the Pd,Pt,Ti system, it yields atomic ratios in a Pt,Pb composition spread thin film that vary significantly from values measured with wavelength dispersive x-ray spectroscopy. A model for resputtering during codeposition is presented to account for these discrepancies, and the model is used to calculate resputter rates during Pt,Pb codeposition. We also employ our model to estimate the resputtering susceptibility of commonly sputtered elements.