| AVS 54th International Symposium | |
| Thin Film | Monday Sessions |
| Session TF-MoA |
| Session: | Emerging Topics in Atomic Layer Deposition |
| Presenter: | A.A. Dameron, University of Colorado at Boulder |
| Authors: | A.A. Dameron, University of Colorado at Boulder S.D. Davidson, University of Colorado at Boulder B.B. Burton, University of Colorado at Boulder J.A. McCormick, University of Colorado at Boulder A.S. Cavanagh, University of Colorado at Boulder S.M. George, University of Colorado at Boulder |
| Correspondent: | Click to Email |
Conformal polymeric films can be grown by a sequential, self-limiting surface chemistry process known as molecular layer deposition (MLD) that is very similar to atomic layer deposition (ALD). The MLD reactants are typically monomers for step-wise condensation polymerization and can yield completely organic or organic-inorganic alloys. Our earlier work has demonstrated polyamide growth using diamines and diacid chlorides. Alucone MLD is performed using trimethylaluminum (TMA) and various glycols as the reactants. When the glycol is ethylene glycol (EG), the alucone is poly(aluminum ethylene glycol), [Al-(OCH2CH2O)x]n. Alucone films have been fabricated on silicon substrates at temperatures ranging from 85 °C to 175 °C. In situ quartz crystal microbalance and ex situ x-ray reflectivity experiments have confirmed linear growth of the alucone film versus number of TMA/EG reaction cycles at all temperatures. The MLD growth rates decreased at higher temperatures. Growth rates were 4 Å per cycle at 85 °C and 1.7 Å per cycle at 135 °C. In situ and ex situ Fourier transform infrared spectroscopy (FTIR) have also been used to monitor the surface reactions during alucone growth. Experiments with other glycols, such as benzene-1,4-diol (hydroquinone), demonstrate the general applicability of the alucone MLD surface chemistry to fabricate organic-inorganic films with tunable functionality.