AVS 54th International Symposium | |
Thin Film | Monday Sessions |
Session TF-MoA |
Session: | Emerging Topics in Atomic Layer Deposition |
Presenter: | D. Seghete, University of Colorado at Boulder |
Authors: | D. Seghete, University of Colorado at Boulder S.M. George, University of Colorado at Boulder |
Correspondent: | Click to Email |
Inorganic/organic multilayers occur in the nacreous layer of the mollusk shell and are among the strongest structures in nature. These "brick and mortar" composites are known for their high elasticity, toughness, and hardness. In this study, we report the fabrication of alternating inorganic and organic multilayers consisting of inorganic alumina (Al2O3) or tungsten (W) in combination with organic alucone polymer. Al2O3 atomic layer deposition (ALD) is performed using trimethylaluminum (TMA) and H2O as the reactants. W ALD is accomplished using WF6 and Si2H6 as the reactants. The organic alucone layer is grown using molecular layer deposition (MLD) with TMA and ethylene glycol as the reactants. The growth of the inorganic/organic multilayers was investigated using in situ quartz crystal microbalance studies. The nucleation of the inorganic Al2O3 or W ALD was explored on the alucone layer. The nucleation of the organic alucone MLD was also examined on the Al2O3 and W layers. The nucleation behavior provides information about the bonding between the inorganic and organic layers. The adhesion between the inorganic and organic layers is important for the mechanical properties of these multilayer structures. The structure and stability of the inorganic/organic multilayers were also explored using x-ray reflectivity measurements. Future mechanical property studies are planned using a nanoindenter.