| AVS 54th International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS2+BI-ThA |
| Session: | Plasmas in Bioscience |
| Presenter: | C. Chen, Industrial Technology Research Institute, Taiwan |
| Authors: | C. Chen, Industrial Technology Research Institute, Taiwan W. Hsieh, Industrial Technology Research Institute, Taiwan C. Liu, Industrial Technology Research Institute, Taiwan W. Hsu, Industrial Technology Research Institute, Taiwan C. Lin, Industrial Technology Research Institute, Taiwan |
| Correspondent: | Click to Email |
In this study hydrophobic thin films were prepared by plasma enhanced chemical vapor deposition at atmospheric pressure by means of two layer compositions on the surface of glass. The bottoms were using Ar and hexamethyldisilazane (HMDSN) as the carrier and monomer gases respectively to deposit silicon oxide and offer microstructure. The deposited glasses were further coating a hydrophobic layer using fluoroalkylsilane (FAS) as the chemical precursor. Meanwhile, to evaluate the effects of fluorine contained of the water repellency of substrate, CF4 was introducing into the plasma zone during plasma depositions. The chemical structure of the thin film was characterized using X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopies (FTIR) measurement. Morphologies and topography of the coatings were examined by scanning micro spectroscopy (SEM) and atomic force microscopy (AFM). FTIR measurement indicated that a SiO2 layer can successful deposit on the glass and the porosity of the thin films was direct proportion with thin film thickness. The SEM results indicated that the thickness of the thin films increasing almost linearly with coating times and the thickness was about 143nm after three times of deposition. AFM results reveal nano-clusters were well distributed on the surface after two layers deposition but introducing CF4 during deposition will slightly reduced the roughness because of decompose reaction between CF4 plasma and the Si atom in the thin films. The deconvolution of the C1s core-level spectra and atomic ratio from XPS measurement indicate FAS can be react and deposited on the top layer. The contact angles of the double layers was 134.0 degree which are great than traditional fluoro-polymer such as polytetrafluoroethylene (PTFE). Otherwise, bypass introducing CF4 during plasma polymerization the contact angle will increased to 143.3 degree indicate the AP plasma can be used to deposit super hydrophobic thin film on the glass surface.