| AVS 54th International Symposium | |
| Applied Surface Science | Tuesday Sessions |
| Session AS-TuA |
| Session: | 3-Dimensional Characterization |
| Presenter: | J.S. Hammond, Physical Electronics |
| Authors: | J.S. Hammond, Physical Electronics S. Raman, Physical Electronics J. Moulder, Physical Electronics N. Sanada, ULVAC-PHI R. Inoue, ULVAC-PHI M. Suzuki, ULVAC-PHI |
| Correspondent: | Click to Email |
For many industrial products, non-uniform surface segregation and contamination of organic constituents on micro-areas of polymeric materials is of great concern. Over the past three years, C60 ion beams have been shown to be very effective for the sputter removal of a surface layer of many organic materials, leaving the remaining surface with minimal chemical damage. By combining a C60 ion gun system with a scanning x-ray microprobe XPS specifically designed for optimum performance for micro-area spectroscopy, chemical state mapping and depth profiling, it is now possible to obtain a three dimensional characterization of organic surfaces. To illustrate this new analytical technique, surface area mapping and micro-area depth profiling of a coated human hair and a micro-area contamination analysis on a thick polymer will be discussed. By using high energy resolution core level spectroscopy as well as valence band chemical state mapping, information on the coating thickness and the spatial dimensions of contamination areas can be obtained. Finally, a comparison between the chemical state damage induced by the C60 ion beam versus the x-ray beam damage during a depth profile will be discussed. Initial experiments indicate that for some polymers, the x-ray beam damage is of greater significance than the chemical changes observed after C60 sputtering. The use of a scanning x-ray beam may facilitate chemical state depth profiling with minimal data artifacts.