| AVS 66th International Symposium & Exhibition | |
| Advanced Surface Engineering Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| SE-ThP2 Plasma and Heat Treatment Response of Carborane Self-Assembled Monolayer on Copper Rupak Thapa, L. Dorsett, S. Malik, R. Bale, S. Wagner, D. Bailey, A.N. Caruso, University of Missouri-Kansas City, J.D. Bielefeld, S.W. King, Intel Corporation, M.M. Paquette, University of Missouri-Kansas City |