| AVS 66th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology Division | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | NS+AS-FrM1 Invited Paper Vibrational Spectroscopy in the Electron Microscope Ondrej Krivanek, N. Dellby, CE. Meyer, A. Mitelberger, T.C. Lovejoy, Nion Co. |
| 9:00am | NS+AS-FrM3 Invited Paper In-situ Electron Microscopy of Localized Surface Plasmon Initiated Reactions Canhui Wang, W.-C. Yang, A. Bruma, UMD/NIST, R. Sharma, National Institute of Sandards and Technology (NIST) |
| 9:40am | NS+AS-FrM5 Invited Paper Nanoscale Manipulation of Redox of Ag by Electron Beam Jianguo Wen, H.P. Sheng, Argonne National Laboratory, J.B. Wang, Wuhan University, China |
| 10:20am | NS+AS-FrM7 Invited Paper Dynamics of Material Surfaces and Interfaces – The Good, the Bad and the Electron Beam Jakob Birkedal Wagner, DTU Nanolab, Technical University of Denmark |
| 11:00am | NS+AS-FrM9 Atomic-Scale Mechanism of Unidirectional Oxide Growth Xianhu Sun, W. Zhu, D. Wu, SUNY Binghamton University, Z. Liu, University of Pittsburgh, X. Chen, L. Yuan, SUNY Binghamton University, G. Wang, University of Pittsburgh, R. Sharma, National Institute of Standards and Technology (NIST), G. Zhou, SUNY Binghamton University |
| 11:20am | NS+AS-FrM10 Application of Electron-beam-excited Localized Surface Plasmon Resonance to Provide Guidelines for Plasmonic Catalysts Wei-Chang Yang, C. Wang, L.A. Fredin, H.J. Lezec, R. Sharma, National Institute of Standards and Technology (NIST) |