Paper SS-TuP6
XPS Study of the Gas Cluster Ion Beam Sputtering of PTFE and Oxygen-treated PTFE
Tuesday, October 22, 2019, 6:30 pm, Room Union Station B
The XPS depth profiling results of polytetrafluoroethylene (PTFE) and oxygen-treated PTFE using monoatomic argon sputtering and gas cluster ion beam (GCIB) sputtering are reported. We evaluated the degrees of surface damage using these two sputtering methods. We found a mild surface damage under GCIB sputtering. On the non-sputtered PTFE surface, only CF2 was present. After GCIB sputtering, CF3 and CF groups were detected. Consistent with the results in the literature, monoatomic Ar sputtering induced a higher degree of damage; the CF3 and CF levels were much higher than those obtained in the GCIB sputtering. The GCIB sputtering of the oxygen-treated PTFE samples revealed that the oxidation layer was mainly located in the top 10 nm. Below 10 nm, the oxygen content became insignificant. Analyzing the distribution of various carbon-fluorine species and comparing to the untreated samples indicated that in the layer from 10 to 60 nm, the PTFE composition or structure was altered by the oxygen treatment, and even at the depth of 120 nm, the property of the PTFE was affected by the oxygen treatment.