| AVS 66th International Symposium & Exhibition | |
| Advanced Surface Engineering Division | Thursday Sessions |
| Session SE+PS-ThM |
| Session: | Plasma-assisted Surface Modification and Deposition Processes |
| Presenter: | Antoine Remy, Université Libre de Bruxelles, Belgium |
| Authors: | A. Remy, Université Libre de Bruxelles, Belgium M.S. Fall, Université Libre de Bruxelles, Belgium F. Reniers, Université Libre de Bruxelles, Belgium |
| Correspondent: | Click to Email |
The deposition of good quality crystalline inorganic coatings by atmospheric pressure dielectric barrier discharge remains a challenge. Thanks to an original coupling of a substrate heating device based on an inductive current loop and located under the dielectric and an atmospheric pressure dielectric barrier discharge, we show that one can deposit in one step crystalline vanadium oxide and titanium oxide, with grain sizes bigger than those achieved by post-deposition annealing. As case study, vanadium oxide and titanium oxide are chosen. The respective precursors (vanadium oxytriisopropoxide - VOTP and titanium tetraisopropoxide – TTIP) are injected as vapors in a home made reactor with argon acting as carrier gas and main plasma gas. Oxygen is injected as reactant in the chamber. The DBD operates using a G10S-V AFS generator, at a frequency of 19 kHz, and with an injected power comprised between 0 and 80 W. The heating unit consists in a inductively coupled device located under the bottom electrode and dielectric and a susceptor place between the substrate and the dielectric. Thanks to a modified design of the bottom electrode, the induction loop does not heat said electrode, but the Eddy current heats only the susceptor, and the substrate. It is shown that this device allows the direct synthesis of crystalline orthorhombic V2O5 at 300°C, and of anatase TiO2 at 400°C. A comparison with coatings deposited at room temperature and annealed at 300 and 400°C respectively shows that the coatings deposited on the heated substrate exhibit larger grain sizes. This original combination of an atmospheric pressure plasma DBD and a device to heat inductively the substrate shows that one can obtain good crystallinity for inorganic coatings, and opens potentially new opportunities for the deposition of such coatings by atmospheric plasma.