| AVS 66th International Symposium & Exhibition | |
| Complex Oxides: Fundamental Properties and Applications Focus Topic | Tuesday Sessions |
| Session OX+EM+HC+MI+NS+SS+TF-TuA |
| Session: | Complex Oxides: Catalysis, Dielectric Properties and Memory Applications |
| Presenter: | Thomas Orvis, University of Southern California |
| Authors: | T. Orvis, University of Southern California M. Surendran, University of Southern California Y. Liu, University of Southern California A. Cunniff, University of Southern California J. Ravichandran, University of Southern California |
| Correspondent: | Click to Email |
Complex oxides can enhance the functionality of electronic and photonic devices by supplementing them with interesting properties such as ferroelectricity, superconductivity, and magnetoresistivity. Furthermore, low dimensionality in these materials can result in additional useful properties, inspiring the continued study of complex oxides in thin film form. However, the deposition of these materials is typically governed by notoriously complex growth mechanisms, revealing the need for in situ probes to observe and understand their precise nature. To this end, we report the in situ observation of chemical composition of complex oxide thin film surfaces with Auger electron microscopy during growth by pulsed laser deposition. Our implementation of real-time monitoring techniques for complex oxide thin films sheds an important light on the intricacies of the relationships between processing conditions and resulting composition.