AVS 66th International Symposium & Exhibition
    Electronic Materials and Photonics Division Wednesday Sessions
       Session EM+2D+NS+TF-WeA

Invited Paper EM+2D+NS+TF-WeA3
Atomic Layer Deposition’s Potential in Sustainability

Wednesday, October 23, 2019, 3:00 pm, Room A214

Session: THEME Session: Electronics and Photonics for a Low-Carbon Future
Presenter: Karen Buechler, ALD NanoSolutions
Correspondent: Click to Email

Atomic layer deposition (ALD) is an exciting thin film deposition technique which holds the promise to permit enormous material innovations. These material innovations are currently enabling advanced catalysts, high capacity energy storage, advanced manufacturing technologies and many other products. Many of these products work towards reducing energy needs. This talk will highlight several examples of advanced material development through ALD which lead to advanced products which in turn are reducing the carbon footprint of consumers and manufacturers.