AVS 66th International Symposium & Exhibition | |
Fundamental Aspects of Material Degradation Focus Topic | Thursday Sessions |
Session DM2+BI+SS-ThA |
Session: | Fundamentals of Catalyst Degradation: Dissolution, Oxidation and Sintering |
Presenter: | Ina Martin, Case Western Reserve University |
Authors: | N.C. Kovach, Colorado School of Mines R. Matthews, Case Western Reserve University E.B. Pentzer, Case Western Reserve University L. Mansfield, National Renewable Energy Laboratory T.J. Peshek, NASA Glenn Research Center I.T. Martin, Case Western Reserve University |
Correspondent: | Click to Email |
APTES modification of thick (~0.8 μm) AZO films significantly impedes the electrical degradation of the material caused by DH exposure, without significantly affecting the initial optical, electrical, or structural properties of the AZO films. Upon 1000 h of DH exposure, resistivity of both systems increased and can be attributed only to decreased mobility, as carrier concentration was consistent. APTES modification slowed the increase in AZO resistivity over 1000 h of DH exposure; however, the protective nature of APTES modification became critical after 1500 h. At this extended exposure time, macroscopic degradation was observed only for bare AZO including pitting and delamination and was accompanied by an increase in resistivity and decrease in carrier concentration. X-ray photoelectron spectroscopy (XPS) data show that the APTES layer stabilizes the oxygen binding environment of the AZO surface, suggesting that covalent passivation of AZO surface sites by silanization essentially “caps” reactive moieties, thereby improving the stability of the material.