AVS 66th International Symposium & Exhibition
    2D Materials Monday Sessions
       Session 2D+EM+MI+NS-MoM

Paper 2D+EM+MI+NS-MoM4
Semiconducting WS2 and h-BN Inks for Printing Optically-active Nanodevices

Monday, October 21, 2019, 9:20 am, Room A216

Session: Properties of 2D Materials including Electronic, Magnetic, Mechanical, Optical, and Thermal Properties I
Presenter: Jay A. Desai, University of Texas at El Paso
Authors: J.A. Desai, University of Texas at El Paso
S. Mazumder, University of North Texas
A.B. Kaul, University of North Texas
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We present our work on dispersions of WS2 and h-BN using cyclohexanone and terpineol (C/T) as the solvent to subsequently print prototype nanodevices. Current-voltage measurements, Raman spectroscopy, and photoluminescence spectroscopy were used to characterize the properties of these inks produced by various sonication techniques such as horn tip sonication, magnetic stirring and shear mixing. Both photodetector and capactive heterostructure devices were formed with these materials. From this analysis, the photoresponsivity and detectivity of the graphene-WS2-graphene heterostructure devices were calculated to be ~ 0.86 A/W and ~ 1013 J, respectively. Capacitance-voltage (C-V) and C-frequency (f) measurements were also conducted, where the V was swept from – 6 V to + 6 V, while the change in C was measured from f ~ 20 kHz up to 3 MHz to gain insights into the nature of the graphene-WS2 interface. An all-inkjet-printed graphene-h-BN-graphene capacitors were fabricated and leakage current density, JLeakage, of up to ~ 0.072 µA/mm2 and capacitance density of up to ~ 2.4 µF/cm2 is reported. Finally, the influence of temperature, frequency, and LED illumination on the performance of the graphene-h-BN-based capacitor is explored with the help of capacitance density-voltage measurements at different parameters to promote the all-inkjet-printed capacitor for photosensitive detector applications.