AVS 65th International Symposium & Exhibition
    Thin Films Division Tuesday Sessions

Session TF-TuM
Emerging Applications for ALD

Tuesday, October 23, 2018, 8:00 am, Room 101A
Moderators: Arrelaine Dameron, Forge Nano, Qing Peng, University of Alabama


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF-TuM1
Atomic Layer Deposition of the Metal Pyrites FeS2, CoS2, and NiS2
Xinwei Wang, Shenzhen Graduate School, Peking University, China
8:20am TF-TuM2
Atomic Layer Deposition of Yttrium Fluoride and Yttrium Oxyfluoride Films with Tunable Stoichiometry
Jasmine Wallas, J.A. Murdzek, D.K. Lancaster, A.S. Cavanagh, S.M. George, University of Colorado at Boulder
8:40am TF-TuM3
Synthesis of Single Phase Two-dimensional SnS2 by Plasma-enhanced Atomic Layer Deposition
J.J. Pyeon, I.-H. Baek, Korea Institute of Science and Technology, T.-M. Chung, Korea Research Institute of Chemical Technology, J.H. Han, Seoul National University of Science and Technology, C.-Y. Kang, SeongKeun Kim, Korea Institute of Science and Technology, Republic of Korea
9:00am TF-TuM4
Phase Selective, Low Temperature Growth of TiO2 by Atomic Layer Epitaxy
Jason Avila, D.R. Boris, S.B. Qadri, J.A. Freitas, S.G. Walton, U.S. Naval Research Laboratory, C.R. Eddy, Jr., U. S. Naval Research Laboratory, V.D. Wheeler, U.S. Naval Research Laboratory
9:20am TF-TuM5
Substrate Biasing During Plasma Atomic Layer Deposition: From Stress-controlled Oxides to Low-resistivity Nitrides
Harm Knoops, Oxford Instruments, The Netherlands, T.F. Faraz, K. Arts, S. Karwal, M.C. Creatore, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands
9:40am TF-TuM6
Development of Novel Superconducting ALD Films for Astronomy Applications
Frank Greer, P. Day, B. Eom, H. Leduc, Jet Propulsion Laboratory, California Institute of Technology
11:00am TF-TuM10
Atomic Layer Deposition of Cobalt Nanoparticles
Gerben van Straaten, W.M.M. Kessels, M.C. Creatore, Eindhoven University of Technology, The Netherlands
11:20am TF-TuM11
Atomic Layer Deposition of Ni-Al-O Catalysts for Water Oxidation
Jon Baker, J.R. Schneider, J.A. Singh, A.J. Mackus, S.F. Bent, Stanford University
11:40am TF-TuM12
Atomic Layer Deposition of Bismuth Vanadate Photoanodes
Sudarat Lee, A.R. Bielinski, S.L. Esarey, J.J. Brancho, University of Michigan, Ann Arbor, B.M. Bartlett, University of Michigan, Ann Arbor, N.P. Dasgupta, University of Michigan, Ann Arbor
12:00pm TF-TuM13
ALD of Cobalt Phosphate Electro-catalyst for Oxygen Evolution Reaction
Valerio Di Palma, Eindhoven University of Technology, The Netherlands, G. Zafeiropoulos, M.N. Tsampas, DIFFER, W.M.M. Kessels, M.C. Creatore, Eindhoven University of Technology, The Netherlands