| AVS 65th International Symposium & Exhibition | |
| 2D Materials Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:20pm | 2D+MI+NS-MoA1 Invited Paper Observing the Mechanisms of Graphene Growth during Chemical Vapor Deposition: Routes to Controlling Layer Number and Domain Size Robert Weatherup, University of Manchester, UK |
| 2:00pm | 2D+MI+NS-MoA3 Band Alignment of 2-D Materials by Internal Photoemission Q. Zhang, S. Zhang, Theiss Research & National Institute of Standards and Technology, B. Sperling, Nhan Nguyen, National Institute of Standards and Technology |
| 2:20pm | 2D+MI+NS-MoA4 Visible to mid-IR Nanoscale Characterization of 2D Materials via Photo-induced Force Microscopy Padraic O'Reilly, D. Nowak, S. Park, Molecular Vista |
| 2:40pm | 2D+MI+NS-MoA5 Invited Paper Polymorphic Structures and Diversified Properties of Low-dimensional Materials Investigated by In situ Electron Microscopy Kazu Suenaga, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
| 3:40pm | 2D+MI+NS-MoA8 Invited Paper Probing Interlayer Interaction in van der Waals Materials by Low-energy Electron Microscopy (LEEM) Johannes Jobst, D. Geelen, Leiden University, Netherlands, R.M. Tromp, IBM, T.J. Watson Research Center, S.J. van der Molen, Huygens-Kamerlingh Onnes Laboratory, Netherlands |
| 4:20pm | 2D+MI+NS-MoA10 Fast Full Wafer Analysis for Graphene and 2D-materials by Imaging Ellipsometry Sebastian Funke, Accurion GmbH, Germany, P. Braueniger-Weimer, S. Hofmann, University of Cambridge, UK, P.H. Thiesen, Accurion GmbH, Germany |