| AVS 65th International Symposium & Exhibition | |
| Vacuum Technology Division | Monday Sessions |
| Session VT-MoA |
| Session: | Pumping and Outgassing |
| Presenter: | Mauro Audi, Agilent Technologies, Italy |
| Authors: | M. Audi, Agilent Technologies, Italy C. Paolini, Agilent Technologies, Italy P. Manassero, Agilent Technologies |
| Correspondent: | Click to Email |
Charged particle emission from ion pumps is a potential major concern in sensitive applications such as Electron Microscopes , Particle Accelerators and Synchrotron Light Sources .
In fact , emitted positive ions and electrons can affect the performance of the machine or the resolution of the instrument.
Optical shield can be used to limit the number of emitted particles , but standard existing solutions have major conductance limitations as an unwanted side effect .
A test campaign on various shielding designs was carried out with a Faraday Cup powered at different bias voltage at the inlet of the ion pump , and the tests were repeated at different operating pressures and voltages .
Test results demonstrate that it is possible to reduce the number of charged particles by three orders of magnitude with minor conductance limitation and consequently maintaining a high fraction of the original ion pump pumping speed .