AVS 65th International Symposium & Exhibition
    Thin Films Division Wednesday Sessions
       Session TF+EM+MI-WeA

Paper TF+EM+MI-WeA8
Epitaxial Growth and Electrical Properties of VO2Thin Films

Wednesday, October 24, 2018, 4:40 pm, Room 102A

Session: Thin Film Processes for Electronics and Optics II
Presenter: Yang Liu, University of Southern California
Authors: Y. Liu, University of Southern California
S. Niu, University of Southern California
T. Orvis, University of Southern California
H. Zhang, University of Southern California
H. Wang, University of Southern California
J. Ravichandran, University of Southern California
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We report the epitaxial growth and the electrical properties, especially the metal-to-insulator transition (MIT) of vanadium dioxide (VO2) thin films synthesized on lanthanum strontium aluminate tantalate (LSAT) (111) substrates by a pulsed laser deposition method. X-ray diffraction study shows that the epitaxial relation between the VO2 thin films and LSAT substrate is given as VO2(020)||LSAT(111) and VO2[001]||LSAT[11-2]. We observed a sharp change of four orders of magnitude in resistance at the MIT temperature of 345K. We measured distinctive Raman spectra below and above the transition point indicating a structural transition between the insulator and metallic phases, as observed in past investigations.