Invited Paper SS+AS+EM-WeA1
Functionalizing Semiconductor Surfaces and Interfaces

Wednesday, October 24, 2018, 2:20 pm, Room 203C

Semiconductor surface and interface science serves as the foundation for applications ranging from microelectronics to optoelectronics to bio-sensing. Given the importance of semiconductor surface chemistry in important technologies of today, understanding the fundamental chemistry at a molecular level is key to future advances. This talk will describe studies on the adsorption of organic molecules at semiconductor surfaces, aimed at the ultimate goal of controlling the chemical and electrical properties of these hybrid systems. The presentation will examine model systems of molecular adsorption on the Ge(100)-2×1 surface using a combination of experimental and theoretical methods. The reactivity of different functional groups will be described, with particular focus on reactions of bi- and trifunctional molecules. The results help elucidate the way in which the molecular structure as well as the identity of the reactive moieties affect the product distribution of the molecules upon adsorption. Monolayer surface chemistry is also extended to the formation of covalently-bound organic multilayers through the process of molecular layer deposition (MLD). Results will be presented of our studies to understand MLD mechanisms and bonding. We show that chain termination events during MLD can be counteracted by absorption of precursors into the MLD film, which reintroduces reactive sites that lead to continuation of film growth. We will also describe new MLD chemistries, including photo-initiated MLD that forms new carbon-carbon bonds at the surface.