AVS 65th International Symposium & Exhibition
    Surface Science Division Thursday Sessions
       Session SS+AS+BI+MI+NS-ThA

Paper SS+AS+BI+MI+NS-ThA7
Electron Interactions with Alkanethiol Self-assembled Monolayers on Au(111)

Thursday, October 25, 2018, 4:20 pm, Room 203C

Session: Organic/Inorganic Surfaces, Interfaces and Nanostructures
Presenter: Jodi Grzeskowiak, University at Albany-SUNY
Authors: J. Grzeskowiak, University at Albany-SUNY
C.A. Ventrice, Jr., SUNY Polytechnic Institute
Correspondent: Click to Email
Self-assembled monolayers (SAMs) are often used for applications such as molecular electronics, selective deposition, and various forms of surface modification. Advanced lithography within the semiconductor industry is adopting ever shorter wavelengths of light such that the interaction of secondary electrons with the organic resist is becoming the primary mechanism for photo-initiated electro-chemical solubility changing reactions. In order to study the interaction of low energy electrons with thin organic films, measurements have been performed on electron decomposition of alkanethiol molecules grown on Au(111) substrates. SAMs have been grown via both solution and vapor phase methods. These monolayers arrange into two distinct phases commonly referred to as lying down and standing up. The lying down phase is a physisorbed layer that is only weakly interacting with the substrate via Van der Waals forces. Conversely, the standing up phase is a chemisorbed species that is more strongly bound to the substrate. Various surface analysis techniques were used to characterize the monolayers before and after electron exposure. Low energy electron diffraction (LEED) was used to determine the structure of the SAM and the rate of decomposition. Temperature programmed desorption (TPD) in combination with mass spectrometry was used to evaluate the thermal stability and bonding strength of the attached SAMs and the decomposition products from electron exposure.