AVS 65th International Symposium & Exhibition
    Advanced Surface Engineering Division Tuesday Sessions
       Session SE+PS-TuM

Invited Paper SE+PS-TuM10
Dedicated Experiments to Challenge a Model for Reactive Magnetron Sputtering

Tuesday, October 23, 2018, 11:00 am, Room 202C

Session: Plasma-assisted Surface Modification and Deposition Processes
Presenter: Diederik Depla, Ghent University, Belgium
Correspondent: Click to Email
Reactive magnetron sputter deposition is conceptual easy technique which can be explained in a few lines. Behind this apparent simplicity there is a complex interplay between different plasma and surface related processes. To get a better understanding of the impact of the different process parameters, modelling is inevitable. Therefore, the paper will first focus on the RSD (Reactive Sputter Deposition) model. As this code is freely downloadable and it has a GUI, it permits not only the research team to investigate this fascinating deposition technique, but also you. Important target processes such as sputtering, chemisorption, direct and knock-on reactive ion implantation will be discussed. With the model as a guide, some important fundamental questions will be tackled. Experiments related to the transition from metallic to poisoned mode, the deposition rate during reactive sputtering, the presence of parameter hysteresis will be presented. The confrontation between model and experiment will highlight not only the success of the RSD model, but also the further challenges to improve this model, and our understanding of reactive magnetron sputtering.