AVS 65th International Symposium & Exhibition | |
Nanometer-scale Science and Technology Division | Thursday Sessions |
Session NS+2D+AS+MN+PC-ThA |
Session: | SPM – Probing Electronic and Transport Properties |
Presenter: | Dan Shan, Yangzhou Polytechnic Institute, China |
Authors: | D. Shan, Yangzhou Polytechnic Institute, China J. Xu, Nanjing Universityy, China |
Correspondent: | Click to Email |
Silica-based semiconductor nano-crystals have attracted much interest in recent years due to their possible applications in many kinds of nano-electronic and optoelectronic devices. Compared with Si, Ge has larger electron and hole mobility. Furthermore, Ge has a narrower band-gap and high phonon responsivity in the near-infrared region, so it is suited to many near-infrared applications. In order to further improve the device performance, detailed knowledge of transport mechanisms across these nano-crystals becomes necessary and is considered indispensable.
In this work, hydrogenated amorphous germanium films were prepared by a plasma enhanced chemical vapor deposition technique. Ge nano-crystals (Ge NCs) films were obtained by thermal annealing the as-deposited samples. P-type behavior in Ge NCs films without any external doping is attributed to the holes accumulation caused by acceptor-like surface states. It can be found that the dark conductivity and Hall mobility reach to as high as 25.4 S/cm and 182 cm2/V·s in the Ge NCs film, which are much higher than the previously reported data. Carrier transport mechanisms of Ge NCs films were investigated by temperature-dependent Hall measurement. Three kinds of temperature-dependent conductivity behaviors, which exhibit the linear relationships of the ln σ versus T-1/4, T-1/2 and T-1, respectively, were observed in the temperature regions of 10-500 K. It can be confirmed that the thermal activation conduction in the extended states dominated the carrier transport process above 300 K (300-500 K). Below room temperature, the carrier transport process was dominated by the percolation-hopping conduction at 90-230 K and turned to Mott-VRH conduction when the temperature falling below 50 K (10-50 K).
Furthermore, the different scattering mechanisms in carrier transport process were found in different temperature regions, which were evaluated via temperature-dependent Hall mobilities. In the low temperature region (10-50 K), the carrier Hall mobility is almost temperature independence (μ~T0), revealing the neutral impurities' scattering mechanism dominated the carrier transport process. When increasing the temperature (50-190 K), the carrier transport properties were controlled by the grain boundary scattering mechanism, where the carrier Hall mobility was increased with temperature and exhibited the thermally activated behavior. However, the relationship of μ~T-0.9 was observed above room temperature (300-500 K). It is suggested that the carrier transport is dominated by a superposition of grain boundary scattering and acoustic phonon scattering within the high temperature region.