| AVS 65th International Symposium & Exhibition | |
| Materials and Processes for Quantum Computing Focus Topic | Tuesday Sessions |
| Session MP+EM+NS-TuM |
| Session: | High Coherence Qubits for Quantum Computing |
| Presenter: | Corey Rae McRae, National Institute of Standards and Technology |
| Authors: | C.R. McRae, National Institute of Standards and Technology X. Wu, National Institute of Standards and Technology M. Bal, National Institute of Standards and Technology J. Long, National Institute of Standards and Technology H.S. Ku, National Institute of Standards and Technology D.P. Pappas, National Institute of Standards and Technology R. Lake, National Institute of Standards and Technology |
| Correspondent: | Click to Email |
Reducing the overall concentration of TLSs in dielectric materials remains at the forefront of materials research in quantum information science. In this work, we measure a lumped element resonator fabricated from a superconductor-dielectric-superconductor trilayer to determine the TLS loss of various dielectrics of interest in superconducting quantum computing. The deposition of the trilayer prior to fabrication allows control of the metal-dielectric interfaces, and the fabrication process is generalized so that resonators containing different dielectrics can be compared easily. This lithography method enables the measurement of trilayer capacitors and junctions that have been prepared entirely in situ in an ultrahigh vacuum environment. In future work, we will interrogate a new class of low-loss dielectrics grown with epitaxial methods using the measurement capabilities developed here.