AVS 65th International Symposium & Exhibition
    2D Materials Focus Topic Friday Sessions
       Session 2D+EM+MN+NS-FrM

Invited Paper 2D+EM+MN+NS-FrM3
Sequential Edge-epitaxy: Towards Two-dimensional Multi-junctions Heterostructures and Superlattices

Friday, October 26, 2018, 9:00 am, Room 201B

Session: Nanostructures including Heterostructures and Patterning of 2D Materials
Presenter: Humberto Rodriguez Gutierrez, University of South Florida
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Atomically thin layers are known as two-dimensional (2D) materials and have attracted a growing attention due to their great potential as building blocks for a future generation of low-power and flexible 2D optoelectronic devices. Similar to the well-established 3D electronics, the development of functional 2D devices will depend on our ability to fabricate heterostructures and junctions where the optical and electronic properties of different compounds are brought together to create new functionalities. Vertical heterostructures can be produced by selective van der Waals stacking of different monolayers with distinct chemical composition. However, in-plane lateral heterostructures, where different materials are combined within a single 2D layer, have proven to be more challenging. During the formation of the hetero-junction, it is important to minimize the incorporation of undesired impurities and the formation of crystal defects at the junction that will impact the functionality of the 2D device. When fabricating periodic structures it is equally important to develop the ability to control the domain size of each material. In this talk, we will review different techniques that have been used to create 2D lateral heterostructures of transition metal dichalcogenide compounds. Emphasis will be made in our recently reported one-pot synthesis approach, using a single heterogeneous solid source, for the continuous fabrication of lateral multi-junction heterostructures of TMD monolayers. In this method, the heterojunctions are sequentially created by only changing the composition of the reactive gas environment in the presence of water vapor. This allows to selectively control the water-induced oxidation and volatilization of each transition metal precursors, as well as its nucleation on the substrate, leading to sequential edge-epitaxy of distinct TMDs. This simple method have proven to be effective for continuous growth of TMD-based multi-junction lateral heterostructures, including selenides, sulfides and ternary alloys. Basic devices with field effect transistor configuration were fabricated to study the electrical behavior of these heterojunctions, their diode-like response, photo-response as a function of laser power as well as photovoltaic behavior of the heterojunctions will be discussed.