AVS 64th International Symposium & Exhibition
    Vacuum Technology Division Tuesday Sessions
       Session VT-TuM

Paper VT-TuM11
EBL2: Realization and Qualification of an EUV Exposure System

Tuesday, October 31, 2017, 11:20 am, Room 7 & 8

Session: Large Vacuum Systems
Presenter: Michel van Putten, TNO, Netherlands
Authors: M. van Putten, TNO, Netherlands
N.B. Koster, TNO, Netherlands
A.F. Deutz, TNO, Netherlands
B.A.H. Nijland, TNO, Netherlands
P.J. Kerkhof, TNO, Netherlands
P.M. Muilwijk, TNO, Netherlands
B.W. Oostdijck, TNO, Netherlands
J. Westerhout, TNO, Netherlands
C.L. Hollemans, TNO, Netherlands
E. te Sligte, TNO, Netherlands
W.F.W. Mulckhuyse, TNO, Netherlands
F.T. Molkenboer, TNO, Netherlands
A.M. Hoogstrate, TNO, Netherlands
P. van der Walle, TNO, Netherlands
J.R.H. Diesveld, TNO, Netherlands
A. Abutan, TNO, Netherlands
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In 2014, TNO started the design of a new facility to test samples with EUV light (13.5 nm). This facility is called EUV Beam Line 2 (EBL2) and enables study of the interaction of lithographic photomasks, optics and other samples with EUV light by irradiation, real-time imaging ellipsometry and in vacuo XPS surface analysis.

The integration of EBL2 started in Q2 of 2016 and at the end of 2016 the major milestone – first light – was reached. Currently, the building phase of EBL2 being completed. During Q3 of 2017 we anticipate to complete the qualification. Once qualified, the EBL2 facility will be accessible for external customers and research groups.

The realization of such a facility is the translation from a design to a manufactured, integrated and tested system. During AVS63 the realization of some of the modules was presented, this presentation will discuss the integration of the complete system. Challenges in this are: motion in vacuum, use of UHV compatible materials, alignment of EUV optics.

The qualification of the EBL2 facility was done in three steps: module verification, system verification, and system validation. During the verification steps, EBL2 and its constituent modules were assessed against specifications. Next was system validation where the ability to satisfy user needs was verified.

This presentation will focus on the completion of the realization of EBL2 and results of the system verification and validation phases.

EBL2’s EUV irradiation performance is discussed in terms of EUV power, vacuum cleanliness, positioning of samples like reticles, and the setup and control of the sample environment in terms of positioning, temperature and gas environment.