AVS 64th International Symposium & Exhibition
    Plasma Science and Technology Division Tuesday Sessions
       Session PS-TuP

Paper PS-TuP30
Development of an Aluminum Nitriding Process using Electrostatic Plasma Mass Spectroscopy and Energy Analysis and In Vacuuo Auger Electron Spectroscopy

Tuesday, October 31, 2017, 6:30 pm, Room Central Hall

Session: Plasma Science and Technology Poster Session
Presenter: Christopher Muratore, m-Nanotech Ltd., University of Dayton
Authors: C. Muratore, m-Nanotech Ltd., University of Dayton
A. Korenyi-Both, Tribologix Inc.
Correspondent: Click to Email
Aluminum nitride is a hard, wear resistant surface. Modifying an aluminum alloy surface by diffusion based plasma treatment is one potential approach for increasing the wear resistance of aluminum components, however, a review of the literature and discussion with industrial nitriding operations reveal that there are a number of challenges associated with this task. The primary challenge is initial removal of the native oxide formed spontaneously on aluminum surfaces, and inhibiting its formation during the process, even at high vacuum. Using a novel plasma nitriding process,thick aluminum nitride layer (>1 micron) was produced on 6061-T6 alloy samples. Key steps included removal of the oxide layer and identification of pulse characteristics fpr the applied power to the cathode. These steps were accomplished using unique in situ process diagnostics including Auger electron spectroscopy to identify the time and conditions required to clean the aluiminum surface and plasma mass spectrometry and energy analysis to identify the optimum ratio of atomic nitrogen atoms compared to molecular nitrogen ions, as identified in prior works for nitriding of stainless steel. It is observed that maximizing the number of atomic nitrogen ions yields higher nitriding rates for aluminum.