| AVS 64th International Symposium & Exhibition | |
| Advanced Ion Microscopy Focus Topic | Thursday Sessions |
| Session HI+BI+NS+TR-ThM |
| Session: | Advanced Ion Microscopy Applications |
| Presenter: | Daniel Emmrich, Bielefeld University, Germany |
| Authors: | D. Emmrich, Bielefeld University, Germany A. Gaul, University of Kassel, Germany D. Holzinger, University of Kassel, Germany A. Ehresmann, University of Kassel, Germany F. Karimian, Kiel University, Germany M. Klug, Kiel University, Germany J. McCord, Kiel University, Germany A. Beyer, Bielefeld University, Germany A. Gölzhäuser, Bielefeld University, Germany |
| Correspondent: | Click to Email |
Microscopes based on gas field ion sources offer surface-sensitive, high resolution imaging and state of the art nano-machining.1 It was further shown that light ions like helium or neon enable a modification of the magnetic properties, e.g., turning thin films from paramagnetic to ferromagnetic state, without significant sputtering.2
In this work, two-dimensional ion bombardment induced magnetic patterning (IBMP)3 is demonstrated with a helium ion microscope to create magnetic domains in an exchange biased thin film system. Such a system consists of a thin ferromagnetic layer coupled to an underlying antiferromagnet. Low dose helium ion irradiation at an energy of 15 keV in an external magnetic field leads to a new, remanent magnetization direction, determined by the external magnetic field. By subsequently patterning the sample in differently orientated external magnetic fields, complex magnetic domain patterns such as chiral structures can be written. Based on magnetic force microscopy and optical Kerr microscopy, we will discuss the achievable resolution as well as the shapes of different artificial magnetic domains.
1G. Hlawacek and A. Gölzhäuser (eds),Helium Ion Microscopy (Springer International Publishing, Switzerland, 2016.).
2F. Roder, G. Hlawacek, S. Wintz, R. Hubner, L. Bischoff, H. Lichte, K. Potzger, J. Lindner, J. Fassbender, and R. Bali, Scientific reports 5, 16786 (2015).
3A. Gaul, S. Hankemeier, D. Holzinger, N.D. Müglich, P. Staeck, R. Frömter, H.P. Oepen, and A. Ehresmann, Journal of Applied Physics 120, 33902 (2016).