| AVS 64th International Symposium & Exhibition | |
| Applied Surface Science Division | Tuesday Sessions |
| Session AS+TF-TuA |
| Session: | Problem Solving Using Surface Analysis in the Industrial Laboratory |
| Presenter: | Vincent Smentkowski, General Electric Global Research Center |
| Correspondent: | Click to Email |
The top few nanometers of a sample is defined as the surface. The surface is where most chemical reactions take place. There are many instances where the surface of materials are designed/functionalized in order to optimize properties and improve device performance; there are other instances where the surface becomes compromised and the material/device performance degrades following treatment and/or use. Accurate characterization is essential in order to understand material/device performance.
Auger Electron Spectroscopy (AES), X-ray Photoelectron Spectroscopy (XPS), Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and Scanning Probe Microscopy (SPM) are the most common, and commercially available, surface analysis techniques. These techniques provide complimentary information regarding both the composition and microstructure of the surface of a sample and often compliments bulk analysis.
In my talk, I will discuss the characterization challenges faced in an industrial setting where the surface analyst is often provided non-ideal samples and is asked to provide both a rapid and complete analysis of the sample. The criticality of talking with the person that submits the sample to understand their issue(s) and what they expect from the analysis (as well as being certain they realize possible complications) will be highlighted via real samples. I will also show a few examples where proof of principle results provided interesting data, however the data were not scientifically meaningful.