| AVS 63rd International Symposium & Exhibition | |
| Thin Film | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF-MoM1 Invited Paper New Heteroleptic Precursors Enabling Industrial Scale ALD of Next Generation Metal Oxides and Metal Films Nicolas Blasco, Air Liquide, France |
| 9:20am | TF-MoM4 Time-resolved IR Spectroscopy during ALD of La2O3/Al2O3 Nanolaminates Brent Sperling, J.E. Maslar, B. Kalanyan, National Institute of Standards and Technology (NIST) |
| 9:40am | TF-MoM5 Invited Paper Incomplete Elimination of Precursor Ligands during Atomic Layer Deposition of Metal Oxides Adrie Mackus, Eindhoven University of Technology, Netherlands, C. MacIsaac, Stanford University, V. Vandalon, W.M.M. Kessels, Eindhoven University of Technology, Netherlands, S.F. Bent, Stanford University |
| 10:40am | TF-MoM8 Surface Chemistry of Pt and Al2O3 ALD Studied with Vibrational Sum-Frequency Generation Vincent Vandalon, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |
| 11:00am | TF-MoM9 Surface Chemistry of Molybdenum Oxide Atomic Layer Deposition: Role of Precursor Chemisorption on Nucleation Delay and Initiating the ALD Process Charith Nanayakkara, A. Vega, The University of Texas at Dallas, G. Liu, C. Dezelah, R. Kanjolia, SAFC Hitech, Y.J. Chabal, University of Texas at Dallas |
| 11:20am | TF-MoM10 In situ FTIR Study of the Surface Reactions during Plasma-assisted Atomic Layer Deposition of SiNx from Silicon Amides Noemi Leick, R.A. Ovanesyan, R.J. Gasvoda, P. Walker, Colorado School of Mines, K.M. Kelchner, D.M. Hausmann, Lam Research Corporation, S. Agarwal, Colorado School of Mines |