AVS 63rd International Symposium & Exhibition
    Thin Film Wednesday Sessions

Session TF+MI+NS-WeM
ALD and Nanostructures

Wednesday, November 9, 2016, 8:00 am, Room 105A
Moderators: Sean King, Intel Corporation, Mariadriana Creatore, Eindhoven University of Technology, Netherlands


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF+MI+NS-WeM1 Invited Paper
Scalable Manufacturing of Nanostructured Materials by Gas-Phase Deposition Techniques
Ruud van Ommen, Delft University of Technology, Netherlands
8:40am TF+MI+NS-WeM3
Surface Passivation of InP Nanowires by Atomic Layer Deposition
Lachlan Black, Y. Cui, A. Cavalli, M.A. Verheijen, E.P.A.M. Bakkers, W.M.M. Kessels, Eindhoven University of Technology, Netherlands
9:00am TF+MI+NS-WeM4
Selectivity and Nucleation Effects in Atomic Layer Deposition of Copper for Plasmonic Nanostructures
Jie Qi, B.G. Willis, University of Connecticut
9:20am TF+MI+NS-WeM5
Metal Oxide Aerogel Patterning by CO2 Laser Etching of ALD-coated Carbon Nanotube Macro-Structures
C. Aksu, P.D. Bradford, Jesse Jur, North Carolina State University
9:40am TF+MI+NS-WeM6
Tungsten ALD in Porous Carbon Nanotube Forests
K. Hinton, N. Hollingworth, D.D. Allred, Richard Vanfleet, Brigham Young University
11:00am TF+MI+NS-WeM10
Rational Design of Hyperbranched ZnO Nanowire Systems for Superomniphobic Surfaces Enabled by ALD
Ashley Bielinski, M. Boban, University of Michigan, Ann Arbor, Y. He, Pacific Northwest National Laboratory, E. Kazyak, University of Michigan, Ann Arbor, C. Wang, Pacific Northwest National Laboratory, A. Tuteja, N.P. Dasgupta, University of Michigan, Ann Arbor
11:20am TF+MI+NS-WeM11
Bio-Templated Morpho Butterfly Wings by ALD for Photocatalysis
Robin E. Rodriguez, D. Das, S.P. Agarwal, University of Michigan, Ann Arbor, W. Shang, T. Deng, Shanghai Jiao Tong University, China, N.P. Dasgupta, University of Michigan, Ann Arbor