AVS 63rd International Symposium & Exhibition | |
Thin Film | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:00am | TF+MI+NS-WeM1 Invited Paper Scalable Manufacturing of Nanostructured Materials by Gas-Phase Deposition Techniques Ruud van Ommen, Delft University of Technology, Netherlands |
8:40am | TF+MI+NS-WeM3 Surface Passivation of InP Nanowires by Atomic Layer Deposition Lachlan Black, Y. Cui, A. Cavalli, M.A. Verheijen, E.P.A.M. Bakkers, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |
9:00am | TF+MI+NS-WeM4 Selectivity and Nucleation Effects in Atomic Layer Deposition of Copper for Plasmonic Nanostructures Jie Qi, B.G. Willis, University of Connecticut |
9:20am | TF+MI+NS-WeM5 Metal Oxide Aerogel Patterning by CO2 Laser Etching of ALD-coated Carbon Nanotube Macro-Structures C. Aksu, P.D. Bradford, Jesse Jur, North Carolina State University |
9:40am | TF+MI+NS-WeM6 Tungsten ALD in Porous Carbon Nanotube Forests K. Hinton, N. Hollingworth, D.D. Allred, Richard Vanfleet, Brigham Young University |
11:00am | TF+MI+NS-WeM10 Rational Design of Hyperbranched ZnO Nanowire Systems for Superomniphobic Surfaces Enabled by ALD Ashley Bielinski, M. Boban, University of Michigan, Ann Arbor, Y. He, Pacific Northwest National Laboratory, E. Kazyak, University of Michigan, Ann Arbor, C. Wang, Pacific Northwest National Laboratory, A. Tuteja, N.P. Dasgupta, University of Michigan, Ann Arbor |
11:20am | TF+MI+NS-WeM11 Bio-Templated Morpho Butterfly Wings by ALD for Photocatalysis Robin E. Rodriguez, D. Das, S.P. Agarwal, University of Michigan, Ann Arbor, W. Shang, T. Deng, Shanghai Jiao Tong University, China, N.P. Dasgupta, University of Michigan, Ann Arbor |