| AVS 63rd International Symposium & Exhibition | |
| Vacuum Technology | Tuesday Sessions |
| Session VT-TuM |
| Session: | Vacuum Pumping and Material Outgassing |
| Presenter: | Alessandro Abatecola, Agilent Technologies, Italy |
| Authors: | A. Abatecola, Agilent Technologies, Italy M. Audi, Agilent Technologies, Italy |
| Correspondent: | Click to Email |
Although Ion pumps are widely and mostly used in UHV conditions, virtually every existing Ion Pump has its maximum pumping speed around 10 E-6 mbar (10E-4 Pa). The discharge intensity in the Ion Pump Penning cell (the number of ions that bombard the cathode per unit time) is pressure dependent, and it is the main parameter that influences the pumping speed.
A study has been performed to evaluate the influence of magnetic fields and cell dimensions on the Ion Pump Discharge Intensity at different pressure. As a result, a combination of parameters has been defined that allows the design and manufacture of an Ion Pump with maximum pumping speed shifted towards lower pressures.
Experimental results with several different experimental set ups are presented.
A new 200 L/S Ion Pump specifically designed for UHV operation that incorporates these findings to obtain maximum pumping speed in the 10E-8 mbar (10E-6 Pa), and with all components subject to Vacuum Firing prior to assembly to obtain the lowest ultimate pressure is described.