AVS 63rd International Symposium & Exhibition
    Vacuum Technology Monday Sessions
       Session VT-MoM

Paper VT-MoM11
Improving Process Resistance of Capacitance Diaphragm Gauges

Monday, November 7, 2016, 11:40 am, Room 104C

Session: Vacuum Measurement, Calibration, Primary and Industry Standards
Presenter: Martin Wüest, INFICON Ltd., Liechtenstein
Authors: B. Andreaus, INFICON Ltd., Liechtenstein
C. Strietzel, INFICON Ltd., Liechtenstein
M.P. Wüest, INFICON Ltd., Liechtenstein
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Process industry is constantly changing. New manufacturing processes using new chemistries are developed that can also affect sensors. Yet, quality and cost pressure demand that processes are highly reliable, repeatable and need fewer maintenance interruptions. For capacitance diaphragm gauges, process stability means that process effects on the diaphragm deflection remain in the 1 nm range for a diaphragm with 30 mm diameter. To cope with this we have investigated ways to better protect the CDGs from process related influences. We will present results from experiments performed with protective layers.