| AVS 63rd International Symposium & Exhibition | |
| Vacuum Technology | Monday Sessions |
| Session VT-MoA |
| Session: | Gas Dynamics, Simulation and Partial Pressure Analysis |
| Presenter: | Michel van Putten, TNO Technical Sciences, Netherlands |
| Authors: | N.B. Koster, TNO Technical Sciences, Netherlands F. de Graaf, TNO Technical Sciences, Netherlands M. van Putten, TNO Technical Sciences, Netherlands P.M. Muilwijk, TNO Technical Sciences, Netherlands E. Nieuwkoop, TNO Technical Sciences, Netherlands O. Kievit, TNO Technical Sciences, Netherlands D.J. Maas, TNO Technical Sciences, Netherlands |
| Correspondent: | Click to Email |
This contribution addresses the introduction of a new type of sensor that can disruptively enhance the yield of manufacturing and inspection tools where ultraclean vacuum and control is needed.This includes tools working with high energy photons, ions or electrons.
In 2007, the development of TNO’s mass-filtered-ion-gauge (MFIG) started when experts realized that IC manufacturing with EUV needs extremely clean vacuum, while existing sensors are either too slow, expensive or insensitive for real-time monitoring of vacuum cleanliness. The promising results of a “quick-and-clean” test were well-received at the AVS meeting in 2008. Hence TNO incubated the concept in an EU project, in which both instrumentation was improved and application requirements were clarified by interacting with the consortium partners. In 2015 TNO has been awarded a NanoNextNL valorization grant to further mature the instrumentation and prepare for MFIG’s market introduction in 2017.
This presentation will update the audience on MFIG’s latest performance in laboratory and field tests as well as tell the story how an idea advanced into a product. A short explanation of the technology and new design will be part of the presentation.