AVS 63rd International Symposium & Exhibition | |
Tribology Focus Topic | Wednesday Sessions |
Session TR+AS+NS+SS-WeA |
Session: | Nanoscale Wear: Applications to Nanometrology and Manufacturing |
Presenter: | Michael L. Falk, Johns Hopkins University |
Authors: | Y. Shao, Johns Hopkins University T.D.B. Jacobs, University of Pittsburgh M.L. Falk, Johns Hopkins University |
Correspondent: | Click to Email |