Paper TF2-ThM6
Sequential Infiltration Synthesis (SIS) and its Applications in Nanofabrication

Thursday, November 10, 2016, 9:40 am, Room 105A

Chemical assembly of materials with atomic/molecular precision is the key to enable new generation technologies. Such sophisticated controllability relies on the understanding of fundamental mechanisms during atomic/molecular assembly processes. In this presentation, I will present the applications of sequential infiltration synthesis (SIS) in nano materials fabrication. The SIS method is based on the coupled diffusion and substrate site-limited reaction process. It shows great promise in the modification of the properties of polymers, and in the scalable and controllable manufacture of nanomaterials. The underlying mechanisms involved in the SIS process will be discussed along with its applications in the advanced lithography, nanostructure engineering and catalyst fabrication.