AVS 63rd International Symposium & Exhibition | |
Surface Science | Tuesday Sessions |
Session SS2+AS+HC+NS-TuM |
Session: | Nanostructures: Growth, Reactivity, and Catalysis |
Presenter: | Joshua Cohen, Tufts University |
Authors: | J. Cohen, Tufts University R.G. Tobin, Tufts University |
Correspondent: | Click to Email |
The change in surface resistivity due to the formation of nickel nanoparticles on gold(111) was studied by measuring the resistance of a thin film of Au as a function of Ni coverage, θ. After annealing, Au(111) configures into the herringbone reconstruction and provides a template for the periodic nucleation and growth of Ni nanoparticles. The Ni islands grow radially until θ ~ 0.3 ML, after which, subsequent Ni atoms contribute almost exclusively to a second layer [1].
Surface resistivity arises primarily from the scattering of the substrate’s conduction electrons by foreign atoms or defects, and studies of the dependence of surface resistivity on coverage yield insights into growth dynamics, interadsorbate interactions, and interactions between the adsorbed atoms and conduction electrons. For randomly distributed non-interacting scatterers the resistivity change is linear in coverage. Since Ni atoms on Au(111) grow in tight ordered nanoclusters, a nonlinear dependence might be anticipated. Our results, however, show a linear dependence on coverage for Ni atoms in the first layer, as if they were independent point scatterers. At coverages above θ ~ 0.3 ML, there is no further change in resistivity, which we attribute to Ni atoms forming a second layer and making no significant contribution to the surface resistivity.
The samples were 150 nm thick epitaxial Au(111) films on mica prepared by sputtering and annealing in ultrahigh vacuum. The resistance of the film was measured as Ni was thermally evaporated on the surface. Ni coverage was determined using Auger electron spectroscopy (AES), corrected for the inelastic mean free path of the electrons.
The resistance and AES data were analyzed in terms of a growth model that allowed for variation in the coverage at which a second layer begins, the relative probabilities of first- and second-layer growth after that point, and the relative contributions of first- and second-layer Ni atoms to the surface resistivity. The results are consistent with the growth model observed with STM [1], and serve as an indirect probe of the growth kinetics of this interesting system, as well as determining for the first time the contributions of the Ni islands to the surface resistivity of the Au film.
1. Chambliss, D.D., R.J. Wilson, and S. Chiang, Ordered Nucleation of Ni and Au Islands on Au (111) Studied By Scanning Tunneling Microscopy. Journal of Vacuum Science & Technology B, 1991. 9(2): p. 933-937.