AVS 63rd International Symposium & Exhibition
    Surface Science Wednesday Sessions
       Session SS+AS-WeM

Paper SS+AS-WeM3
Low Energy Electron Microscopy at Near Ambient Pressures

Wednesday, November 9, 2016, 8:40 am, Room 104E

Session: Environmental Interfaces, Ambient Surfaces, and In-Operando Studies
Presenter: Andreas Thissen, SPECS Surface Nano Analysis GmbH, Germany
Correspondent: Click to Email
Low-energy electron microscopy (LEEM) is a spectromicroscopy technique, which allows the study of dynamic processes at surfaces and interfaces, such as thin-film growth, surface reactions, and phase transitions. With the FE-LEEM P90 from SPECS, which is based on the instrument design by Rudolf Tromp from IBM [1,2], lateral and energy resolution of below 5 nm and 250 meV, respectively, can be achieved. Depending on the excitation source and the settings on the instrument a variety of different imaging modes are possible: mirror electron microscopy, low energy electron diffraction (LEED), phase contrast imaging, reflectivity contrast, dark field imaging and bright field imaging, as well as photoelectron emission microscopy and spectroscopy.

We have enhanced the technical capabilities of the FE-LEEM P90 towards studies under near ambient conditions by developing a special sample geometry. This enables the analysis of materials and devices under near ambient conditions and even in situ during operation.