AVS 63rd International Symposium & Exhibition
    Advanced Surface Engineering Tuesday Sessions
       Session SE-TuP

Paper SE-TuP3
Microstructure and Properties of (ZrHf)N Thin Films Deposited by Sputtering at Room Temperature

Tuesday, November 8, 2016, 6:30 pm, Room Hall D

Session: Advanced Surface Engineering Poster Session
Presenter: Yu-Wei Lin, ITRC, National Applied Research Laboratories, Tawain, Republic of China
Authors: N.N. Chu, ITRC, National Applied Research Laboratories, Tawain, Republic of China
Y.-W. Lin, ITRC, National Applied Research Laboratories, Tawain, Republic of China
C.-N. Hsiao, ITRC, National Applied Research Laboratories, Tawain, Republic of China
Correspondent: Click to Email
This study investigated the microstructure and properties of nano-crystalline (ZrHf)N films on Si substrate at room temperature. (ZrHf)N films were prepared by reactive magnetron sputtering based on our previous optimum coating conditions (substrate temperature, system pressure, nitrogen flow etc.) for HfN and ZrN thin films. Based on the early studies, metal nitride coatings have attracted attention for good mechanical properties, hardness up to 30 GPa. In the study, we should have a generalized definition for substitutional solid solution. The addition of Hf into ZrN (or addition of Zr into HfN) forms the substitutional solid solution ZrHfN (or HfZrN). Different ratios of Hf/Zr will form various structure for (ZrxHf1-x)N with interesting properties, and many characteristics, such as nanostructure and hardness remain to be studied further. Characterizing the structure and properties of single ZrHfN layer coating with the different ratio of Hf-Zr to find out the optimum processing parameters, and further to tailor a variety of surface coating applications is the objective of this project.