AVS 63rd International Symposium & Exhibition
    Advanced Surface Engineering Tuesday Sessions
       Session SE+MS+TF-TuA

Paper SE+MS+TF-TuA2
Engineering a WC/Co Carbide Surface for PVD and CVD coatings

Tuesday, November 8, 2016, 2:40 pm, Room 101C

Session: Innovations in PVD, CVD, Atmospheric Pressure Plasma and Other Surface Technologies
Presenter: Aharon Inspektor, Carnegie Mellon University
Authors: A. Inspektor, Carnegie Mellon University
P.A. Salvador, Carnegie Mellon University
D. Banerjee, Kennametal Inc.
C. McNerny, Kennametal Inc.
M. Rowe, Kennametal Inc.
P. Mehrotra, Kennametal Inc.
Correspondent: Click to Email
The emergence of new coating technologies is driving the development of new cutting tools and improved metal cutting techniques. However, to reach these goals, the coating has to work in concert with the tool substrate material. Hence, building a functional surface that consists of coating and substrate working together, is a key step in the development of new cutting tool. In this paper we will look at the substrate side of the coating - surface interface and discuss how it affects the properties of the subsequent coating. The focus will be on surface engineering of WC/Co carbide surface for Physical Vapor Deposition, PVD, for Chemical Vapor Deposition, CVD, and for CVD diamond coatings. Specifically, Co mobility in the subsurface zone for CVD coatings and surface treatment for PVD coatings. Structure and properties of the resultant surface - coating combination will be presented and discussed.