AVS 63rd International Symposium & Exhibition | |
Novel Trends in Synchrotron and FEL-Based Analysis Focus Topic | Tuesday Sessions |
Session SA+AS+BI+MI-TuA |
Session: | Synchrotron and XFEL Advances for Biological Systems (2:20-3:40 pm)/Synchrotron Radiation at the Frontiers of Device Technology (4:20-6:20 pm) |
Presenter: | Hongtao Yuan, SLAC National Accelerator Laboratory |
Correspondent: | Click to Email |
Electric-field control of charge carrier density has attracted much attention since it is remarkably simple for modulating physical properties of condensed matters and for exploring new functionalities with a transistor configuration. Owing to the limitation of dielectric breakdown in most solid dielectrics, the maximum carrier density accumulated in conventional field-effect transistors (FETs) is quite low (<< 1013 cm-2) and thus seriously limits the tunability of electronic states of solids, for example, not sufficient enough to induce insulator-to-superconductor transition. While the electric-double-layer transistor (EDLT) with ionic liquids (ILs, or ionic gel) as gate dielectrics have been proved to be able to effectively attain a high carrier density up to levels of around 1015 cm-2 and to realize a large local electric field up to 50 MV/cm at liquid/solid interfaces. For example, electric-double-layer transistors have been demonstrated for an electric-field control of emergent interfacial quantum phenomena and the electronics phase transitions in condense matters, such as insulator-superconductivity and paramagnetism-ferromagnetism transitions. However, the mechanistic/spectropic understanding of the local electronic structures at such highly charged IL/oxide EDL interfaces and also further modification under gate-bias remain elucidated and challenging.
In this talk, we conducted synchrotron radiation based X-ray absorption spectroscopy (XAS) and Auger electron spectroscopy (AES) combined with in situ electrical measurements to directly characterize the evolution of the electronic structure at a representative IL/La0.7Sr0.3MnO3 (LSMO) thin film interface. We find a significant valence reduction localized to the topmost LSMO layer after interface formation, and that the gate-bias predominantly modulates this surface reduced Mn species effectively converting these top layers into an insulator. We expect the synchrotron radiation based photon science probing techniques will directly shed light on the understanding of interfacial electronic phase control under the electric field.
(This work was done in collaboration with Bongju Kim, Jun-Sik Lee, Yasuyuki Hikita adn Harold Y. Hwang. This work was supported by the Department of Energy, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering, under contract DE-AC02-76SF00515.)