AVS 63rd International Symposium & Exhibition
    Plasma Processing for Biomedical Applications Focus Topic Monday Sessions
       Session PB+BI+PS-MoA

Paper PB+BI+PS-MoA11
Plasma-based Functionalization of Polystyrene Surfaces of Cell Culture Plates

Monday, November 7, 2016, 5:00 pm, Room 101A

Session: Plasma Processing of Biomaterials
Presenter: Kazuma Nishiyama, Osaka University, Japan
Authors: K. Nishiyama, Osaka University, Japan
T. Ito, Osaka University, Japan
S. Sugimoto, Osaka University, Japan
K. Gotoh, Osaka University, Japan
M. Isobe, Osaka University, Japan
M. Okamoto, Osaka University Hospital, Japan
A. Myoui, Osaka University Hospital, Japanl
H. Yoshikawa, Osaka University, Japan
S. Hamaguchi, Osaka University, Japan
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Polystyrene is one of the most widely used cell-culture plate materials. Amino and/or carboxyl coated cell culture plates are commercially available and such surface functionalizations are known to contribute effectively to the control of growth and differentiation of various stem cells. Plasma-enhanced chemical vapor deposition (PECVD) or plasma ion implantation may be used to functionalize polystyrene surfaces of cell culture dishes. The goal of this research is to understand how such surface functionalizations are affected by plasma conditions. In this study, we have used molecular dynamics (MD) simulation to understand how incident ions and free radicals affect the formation of amines and carboxyl groups. The simulation is based on interatomic reactive potential functions developed in-house based on quantum mechanical calculations. Results of MD simulations under the conditions similar to PE-CVD by ammonia (NH3), cyclopropylamine (CPA), or N2/CH3OH plasmas or ion implantation by NH3, N2/H2, or N2/CH3OH plasmas suggest that, with energetic ion bombardment, functional groups such as primary amines are less likely to form and nitridation of the surface tends to occur. Some simulation results have been compared with experimental data obtained from parallel-plate discharges with an inverter power supply at a relatively high gas pressure of 250 - 2,500 Pa and found to be in good quantitative agreement.