Paper NS-MoM5
Elucidating Proximity Effects during Direct-Write Synthesis of Complex 3D Nanostructures

Monday, November 7, 2016, 9:40 am, Room 101D

Cutting edge 3-dimensional nanofabrication techniques are essential for the future technological advancement in many fields and applications ranging from metamaterials to memory devices. One technique to realize truly flexible 3D nanoprinting is focused electron beam induced deposition (EBID), which uses a focused scanning electron beam to decompose precursor molecules adsorbed onto a substrate surface. The electron/precursor/solid intersection generates a deposit composed of the desired material and shape dictated by the prescribed scanning parameters. EBID has the advantage of being compatible with a wide range of materials, substrates and complex geometries at the nanoscale.

In this work, we will overview the relevant electron/precursor/solid interactions and present a systematic study of the geometric dependence of unwanted proximity effects that occur during the deposition process. Notably, we present a solution designed to minimize proximal deposition by appropriately adjusting the scanning parameters and beam conditions dependent on the desired final geometry. Specifically, we have developed a computer aided design (CAD) program that automatically calibrates the scanning pattern by calculating the predicted contribution from nearest neighbor elements. Our program has been demonstrated for use with platinum and gold structures grown from the organometallic precursors MeCpPt(IV)Me₃ and Me2Au(acac) and the principles can easily be adapted to other material systems. Furthermore, we will demonstrate a laser-assisted process which significantly reduces contamination in the nanoscale deposits.