AVS 63rd International Symposium & Exhibition
    Electronic Materials and Photonics Thursday Sessions
       Session EM+SS+TF-ThA

Paper EM+SS+TF-ThA1
Strain Engineering of Ultrathin Metal Oxide Coatings Deposited using Atomic Layer Deposition for Controlled Electrochemical Energy Storage

Thursday, November 10, 2016, 2:20 pm, Room 102A

Session: Materials and Interfaces for Energy Storage
Presenter: Nitin Muralidharan, Vanderbilt University
Authors: N. Muralidharan, Vanderbilt University
R.E. Carter, Vanderbilt University
A.P. Cohn, Vanderbilt University
L. Oakes, Vanderbilt University
C.L. Pint, Vanderbilt University
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Strain engineering has transformed applications in the semiconductor electronics industry, but has not been widely explored as a tool for electrochemical applications. Here we study the role of strain on the electrochemistry of metal oxide coatings deposited using atomic layer deposition onto super-elastic NiTi alloy surfaces. Specifically, we focus on vanadium pentoxide (V2O5) due to its well-known capability to function as a cathode for the intercalation of lithium ions. Exploiting the capability of NiTi to “lock-in” strain in the elastic regime, which extends up to ~ 15% strain, we study the correlation between strain transferred to the V2O5 active material and the electrochemical performance during lithium intercalation. Overall, our results indicate that pre-straining the material changes both the kinetics and energetics for intercalation properties. Furthermore, the diffusion coefficient of lithium ions in the V2O5 lattice can be effectively doubled through the application of elastic strains as low as ~0.25%. These results provide a route to controllably engineer bulk materials using principles of mechanics to improve battery or other electrochemical application performance.