| AVS 63rd International Symposium & Exhibition | |
| Applied Surface Science | Wednesday Sessions |
| Session AS+SS-WeM |
| Session: | Applications where Surface Analysis is Your Only Hope |
| Presenter: | John Newman, Physical Electronics USA |
| Authors: | J. Newman, Physical Electronics USA S.R. Bryan, Physical Electronics USA D.M. Carr, Physical Electronics USA G.L. Fisher, Physical Electronics USA J.S. Hammond, Physical Electronics USA J.E. Mann, Physical Electronics USA T. Miyayama, ULVAC-PHI, Japan J.F. Moulder, Physical Electronics USA D. Paul, Physical Electronics USA R. Inoue, ULVAC-PHI, Japan B. Schmidt, Physical Electronics USA |
| Correspondent: | Click to Email |
In today’s technologically advanced laboratories there are many dozens of different, and very specialized, analytical techniques being used to attempt to solve problems and characterize materials. When choosing the proper technique for a particular application, the needs of the study are matched to the attributes of a particular method – its depth of analysis, detection sensitivity, analytical spot size, type of information provided, and whether or not the technique is appropriate for the sample in question. For applications where the region of interest is measured in atomic layers, surface sensitive methods such as Auger Electron Spectroscopy, X-ray Photoelectron Spectroscopy, and Time-of-Flight Secondary Ion Mass Spectrometry have always been the methods of choice and, in most cases, really the only hope for a successful analysis.
However, when we look at the relatively recent technological advances in these three methods, we find that their increased capabilities expand their usefulness to much more than the traditional types of surface experiments. For example, gas cluster beams now allow for intact organic information to be obtained from depth profiles or cross-sectioned samples; higher energy x-ray beams allow for deeper analysis depths compared to traditional XPS x-ray beams; and tandem mass spectrometry technology can provide unambiguous peak identification in TOF-SIMS. This presentation will look at applications where some of these advancements are used; exemplifying how newer technologies are making these techniques our only hope for a much wider array of studies.