| AVS 63rd International Symposium & Exhibition | |
| 2D Materials Focus Topic | Thursday Sessions |
| Session 2D-ThP |
| Session: | 2D Materials Poster Session |
| Presenter: | Karim Monfil-Leyva, Benemerita Universidad Autónoma de Puebla, Mexico |
| Authors: | K. Monfil-Leyva, Benemerita Universidad Autónoma de Puebla, Mexico R.C. Ambrosio-Lázaro, Benemerita Universidad Autónoma de Puebla, Mexico J.A. Luna-López, Benemerita Universidad Autónoma de Puebla, Mexico A.L. Muñoz-Zurita, Universidad Politécnica Metropolitana de Puebla, Mexico |
| Correspondent: | Click to Email |
Research and development of Transparent Conducting Oxides (TCOs) has increased due to their many industrial applications. In particular, Fluorine doped Tin Oxide (FTO) is actually needed to develop semiconductor devices because this material has repeatable optical and electrical properties . This work shows a comparative study of the optical and electrical properties of FTO thin films obtained by electronic spray pyrolysis and ultrasonic spray pyrolysis techniques. A chemical solution for spraying purposes was prepared with stannic chloride (SnCl) dissolved in ethanol (C2H6O2) mixed with ammonium fluoride (NH4F). FTO thin films were deposited on glass substrates varying the distance from the nozzle to the hot plate. Spray pyrolysis system was controlled by an electronic trigger. Ultrasonic pyrolysis system was controlled by a resonant frequency. The transmittance and reflection properties were measured using an UV-Vis Spectrophotometer and the band gap energy was determined. The average transmittance in the visible range of FTO films was even above 85%. All FTO films were characterized using X-Ray Diffraction (XRD) and Scanning Electron Microscopy (SEM). The X-ray diffraction patterns showed that main growth orientations were [110], [101] and [211]. SEM images showed homogeneous surface on FTO films but they also indicated a change on nano-cluster sizes and density according to the distance from the nozzle to the hot plate and according to the used spray pyrolysis technique. XRD results were used to calculate the grain size and lattice parameters. The chemical composition of the FTO films was also analyzed using Electron Diffraction Scanning (EDS) and the obtained atomic concentration was compared. Sheet resistance was measured using a four points arrangement and the minimum sheet resistance was 14 Ω/square. Optical and electrical results of the FTO thin films showed suitable properties for photovoltaic and optoelectronic applications using fast, cheap and large area deposition techniques.