| AVS 63rd International Symposium & Exhibition | |
| 2D Materials Focus Topic | Thursday Sessions |
| Session 2D-ThP |
| Session: | 2D Materials Poster Session |
| Presenter: | Michael G. Stanford, The University of Tennessee Knoxville |
| Authors: | M.G. Stanford, The University of Tennessee Knoxville P.R. Pudasaini, The University of Tennessee Knoxville A.T. Wong, The University of Tennessee Knoxville A. Hoffman, The University of Tennessee Knoxville D.G. Mandrus, The University of Tennessee Knoxville P.D. Rack, The University of Tennessee Knoxville |
| Correspondent: | Click to Email |
The helium ion microscope (HIM) has garnered much attention in recent years due to its high resolution and precision as a nanoprocessing tool. In this work, we introduce a focused helium ion beam induced etching (FIBIE) process which enables direct-write patterning of WSe2. The etching process utilizes the XeF2 precursor molecule to provide a chemical etch assist for rapid material removal. The FIBIE process enables the high fidelity patterning of WSe2 with He+ doses an order of magnitude lower than standard He+ milling procedures. Of particular interest, transition metal dichalcogenide (TMD) nanoribbons exhibit unique magnetic properties depending upon edge termination. However, few experimental studies have been conducted on TMD nanoribbons due to difficulty of fabrication. The FIBIE process enables the straightforward direct-write fabrication of aligned arrays of WSe2 nanoribbons with dimensions as low as 8 nm. The WSe2 nanoribbons demonstrate high optical anisotropy and electrical measurements are reported for the first time. We also study the magnetic properties and report magnetoresistance of devices fabricated from WSe2 nanoribbon arrays.